首页 | 本学科首页   官方微博 | 高级检索  
文章检索
  按 检索   检索词:      
出版年份:   被引次数:   他引次数: 提示:输入*表示无穷大
  收费全文   12437篇
  免费   1091篇
  国内免费   906篇
化学   7849篇
晶体学   95篇
力学   813篇
综合类   30篇
数学   443篇
物理学   5204篇
  2024年   7篇
  2023年   115篇
  2022年   171篇
  2021年   225篇
  2020年   306篇
  2019年   294篇
  2018年   256篇
  2017年   303篇
  2016年   480篇
  2015年   388篇
  2014年   556篇
  2013年   1039篇
  2012年   765篇
  2011年   833篇
  2010年   673篇
  2009年   850篇
  2008年   850篇
  2007年   935篇
  2006年   866篇
  2005年   547篇
  2004年   540篇
  2003年   492篇
  2002年   365篇
  2001年   317篇
  2000年   304篇
  1999年   233篇
  1998年   269篇
  1997年   166篇
  1996年   141篇
  1995年   125篇
  1994年   159篇
  1993年   108篇
  1992年   103篇
  1991年   93篇
  1990年   63篇
  1989年   79篇
  1988年   58篇
  1987年   49篇
  1986年   31篇
  1985年   33篇
  1984年   52篇
  1983年   16篇
  1982年   33篇
  1981年   27篇
  1980年   20篇
  1979年   27篇
  1978年   17篇
  1977年   8篇
  1976年   14篇
  1973年   14篇
排序方式: 共有10000条查询结果,搜索用时 359 毫秒
71.
S Uma Sankar 《Pramana》2006,67(4):655-663
In this talk I review the physics possible at India-based Neutrino Observatory (INO). I discuss the improvement in the precision of currently known quantities and the possibility measuring the presently unknown quantities.  相似文献   
72.
73.
The thermal stability and measurement temperature dependence of Schottky contact characteristics on n-GaN using a W2B5/Ti/Au metallization scheme was studied using current-voltage (I-V), scanning electron microscopy (SEM) and Auger electron spectroscopy (AES) measurements. The elemental profile obtained from samples annealed at 350 °C showed some titanium diffusion into the gold layer but little other difference from the as-deposited wafer. Annealing at 700 °C produced significant diffusion of titanium. The Schottky barrier height increased with anneal temperature up to 200 °C, reaching a maximum value of 0.65 eV, but decreased at higher annealing temperatures. The reverse breakdown voltage from diodes fabricated using the W2B5-based contacts showed a similar dependence. The reverse current magnitude was larger than predicted by thermionic emission alone. The barrier height showed only minor changes with measurement temperature up to 150 °C.  相似文献   
74.
Munshi G. Mustafa 《Pramana》2006,66(4):669-687
We briefly introduce the thermal field theory within imaginary time formalism, the hard thermal loop perturbation theory and some of its applications to the physics of the quark-gluon plasma, possibly created in relativistic heavy-ion collisions  相似文献   
75.
Eur. Phys. J. B 24, 315 (2001) Here we comment on a recently published paper on the presence of a phason contribution in the low temperature heat capacity data of the charge-density-wave compounds K0.3MoO3 and (TaSe4)2I. We have shown that the anomaly in the C P / T 3 data reported by Odin et al. is straightforwardly interpreted in terms of low energy phonon modes resulting from the peculiar topology of these compounds. Received 21 February 2002 Published online 19 July 2002  相似文献   
76.
 受激拉曼散射和热效应会限制光纤激光器功率的提高。利用高功率光纤激光器的速率方程和热传导方程,理论研究了双端泵浦和分布泵浦下双包层光纤激光器的受激拉曼散射和热效应,得到了光纤中的泵浦光、激光和斯托克斯光的功率分布,光纤激光器的输出特性以及光纤中的温度分布。分析表明,当泵浦功率增大到一定值时,光纤激光器中出现SRS,一部分激光功率会转移给斯托克斯光,影响激光功率进一步提高;与双端泵浦方式相比,分布泵浦下光纤激光器的斜率效率和最大输出功率相差不大,但是,光纤中的温度分布被有效地降低,因此,分布泵浦方式更为有效。  相似文献   
77.
 开展了热容模式下激光介质动态光学畸变研究,初步分析了温度梯度、光弹效应及介质端面变形对整个波前畸变带来的影响,并将光学畸变转化为谐振腔损耗,数值模拟了热容激光器输出功率随时间的变化规律,模拟结果表明:当激光器工作温度低于400 K时,由粒子数玻耳兹曼分布引起的功率下降可以忽略,动态热效应是实验中热容激光器输出功率随时间快速下降的原因。  相似文献   
78.
高峰  王艳  游开明  姚凌江 《物理学报》2006,55(6):2966-2971
采用模匹配方法,研究了非均匀磁场下开放的四端量子波导中的电子输运性质. 结果表明,从一端入射的电子可以透射到两个与之垂直的输出端和一个与之平行的输出端. 在没有外加磁场的情况下,两个垂直输出端的输运概率是相同的,但垂直端与水平端的输运概率不同;在外加磁场下,由于磁边缘态效应,两个垂直输出端的输运概率也有着相当大的差别. 通过施加不同的磁场,我们能获得丰富的电子输运结构,如台阶,宽谷,尖峰等;通过调节磁场的大小和比例以及结构参数可控制该量子结构在各输出端的输运概率. 关键词: 电子输运 介观体系 磁效应  相似文献   
79.
In this paper the effects of surface roughness and annealing temperature (T) of latex coating films on adhesion are discussed for the different stages of the film formation process. The surface free energy of latex films was assessed in terms of practical work of adhesion (W) (or adherence) using a custom-built adhesion-testing device (ATD), atomic force microscopy (AFM), and contact angle measurements. For preannealed latex films surface roughness averages (Ra) were determined from AFM height images and were related to the values of W obtained from ATD measurements at room temperature. The results obtained using these tests exhibiting surface behavior on different length scales indicate a dependence of the measured adhesion on surface roughness and temperature, as well as on the length scale of the measurements.First preannealed samples were studied, which were obtained by heat treatment above the respective glass transition temperatures (Tg). Increasing the temperature of preannealing resulted in a decrease of the adherence observed in ATD experiments at room temperature. However, on the nanoscale, using AFM, no significant variation of the adherence was observed. This observation can be explained by roughness arguments. Preannealing decreases roughness which results in lower adherence values measured by ATD while for essentially single asperity AFM experiments roughness has an insignificant effect. Specimens were also annealed over a constant period of time (90 min) at different temperatures. At the end of the heat treatment, adhesion was measured at the treatment temperature by ATD. The amplified effect of temperature observed in this case on adherence is attributed to the combination of roughness decrease and increasing test temperature. In a third set of experiments completely annealed samples were studied by ATD as well as by AFM as a function of temperature. With increasing T values ATD showed a decrease in adherence, which is attributed to a decreasing surface free energy of the annealed films at elevated T values. AFM, on the other hand, showed an opposite trend which is assigned to increasing penetration of the tip into the tip/wetting polymer samples versus increasing temperature. Finally, annealing isotherms as a function of time were investigated by ATD in situ at different temperatures. This last set of experiments allowed us to optimize annealing time and temperature to achieve complete curing.  相似文献   
80.
We review a novel approach to treating many-body effects in diffusion-limited kinetics. The derivation of the general expression for the survival probability of a Brownian particle in the presence of randomly distributed traps is given. The reduction of this expression to both the Smoluchowski solultion and the wellknown asymptotic behavior is demonstrated. It is shown that the Smoluchowski solution gives a lower bound for the particle survival probability. The correction to the Smoluchowski solution which takes into account the particle death slowdown in the initial process stage is described. The steady-state rate-constant concentration dependence and the reflection of many-body effects in it are discussed in detail.  相似文献   
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号